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中国科技术语 ›› 2014, Vol. 16 ›› Issue (zk1): 75-76.doi: 10.3969/j.issn.1673-8578.2014.zk1.029
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王晓东
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作者简介:
WANG Xiaodong
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摘要: 光刻机技术是大规模集成电路制造领域中的核心技术。文章介绍了光刻机的概念、结构及其简要技术发展历程,并列举和解释了光刻机技术领域的重点技术术语,此外,针对光刻机技术的专利文献查新检索,总结了光刻机技术在专利文献分类中的分布情况。
关键词: 光刻, 光刻机, 专利, IPC分类
Abstract: Lithography tool is a core device used in the manufacture of integrated circuits. The concept, construction and development of lithography tool are introduced in this paper. Several important technical terms are commentated. The distribution of patent literatures concerning the stepper in the IPC classification is proposed for sci-tech novelty retrieval.
Key words: lithography, lithography tool, patent, IPC
中图分类号:
N04 (术语规范及交流)
TN4 (微电子学、集成电路(IC))
TN30S
王晓东. “光刻机”的概念、技术及其在专利文献中的分布[J]. 中国科技术语, 2014, 16(zk1): 75-76.
WANG Xiaodong. Technology of Lithography Tool and its Distribution in Patent Literatures[J]. China Terminology, 2014, 16(zk1): 75-76.
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链接本文: https://www.term.org.cn/CN/10.3969/j.issn.1673-8578.2014.zk1.029
https://www.term.org.cn/CN/Y2014/V16/Izk1/75