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中国科技术语 ›› 2014, Vol. 16 ›› Issue (zk1): 183-185.doi: 10.3969/j.issn.1673-8578.2014.zk1.072
• 探讨与争鸣 • 上一篇
王妍
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作者简介:
WANG Yan
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摘要： 负性显影作为近年来出现的显影技术,应用于半导体器件制造的光刻工艺中,通过使用特殊的溶剂使得图像反转,能够形成高分辨率的图案,在纳米级器件的制造方面具有广阔的应用前景。
关键词: 负性显影, 光刻, 分辨率
Abstract: As a technology of developing which appeared in recent years, negative tone development is applied in lithography for fabricating the semiconductor device. It makes the pattern reversal by using special solvents, forms high-resolution pattern, and has a wide future in application in the fabrication of nanoscale devices.
Key words: negative tone development, lithography, resolution
中图分类号:
N04 (术语规范及交流)
TN305 (半导体器件制造工艺及设备)
TN4 (微电子学、集成电路（IC）)
王妍. 浅析负性显影技术[J]. 中国科技术语, 2014, 16(zk1): 183-185.
WANG Yan. On Negative Tone Development[J]. China Terminology, 2014, 16(zk1): 183-185.
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链接本文: https://www.term.org.cn/CN/10.3969/j.issn.1673-8578.2014.zk1.072
https://www.term.org.cn/CN/Y2014/V16/Izk1/183
